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发明名称
POSITIVE-WORKING PHOTORESIST COMPOSITION AND METHOD FOR FORMING A LIGHT-ABSORBING MATRIX IN A COLOR CRT STRUCTURE
摘要
申请公布号
HK59288(A)
申请公布日期
1988.08.12
申请号
HK19880000592
申请日期
1988.08.04
申请人
NORTH AMERICAN PHILIPS CORPORATION
发明人
LAMBERT, ROBERT LINCOLN;NAGEL, JUDY ANN;BERGAMO, ROBERT LEO
分类号
G03C1/72;C08L29/00;C08L29/04;G03F7/039;H01J9/227;(IPC1-7):G03F7/10
主分类号
G03C1/72
代理机构
代理人
主权项
地址
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