发明名称 DISSOLVING DEVICE FOR SEMICONDUCTOR THIN FILM
摘要 PURPOSE:To prepare dissolving liquid for a semiconductor thin film without causing any contamination with a reagent and environment by providing a storage container which contains volatile semiconductor thin film decomposed materials in an enclosed container. CONSTITUTION:When the semiconductor material in the storage container 2 is heated by electric resistance, gas is produced and diffused in a storage container 8 and the gas is condensed on the surfaces of respective areas of a semiconductor thin film sample 12 divided into the plural areas by a frame body, and thin semiconductor films in the respective areas are decomposed separately. Thus, high-purity decomposed gas is condensed on the surface of the semiconductor thin film sample 12 to perform decomposition, so the amount of impurities in the thin semiconductor film is measured with high sensitivity. Further, the thin film in the enclosed container 1 is decomposed and the environmental contamination is reducible. Furthermore, the semiconductor sample 12 is divided into the plural areas by the frame body 13 and the thin semiconductor film is decomposed corresponding to the respective areas, so the in-surface distribution in the thin semiconductor film is accurately measured.
申请公布号 JPS63195540(A) 申请公布日期 1988.08.12
申请号 JP19870027664 申请日期 1987.02.09
申请人 TOSHIBA CORP 发明人 MATSUNAGA HIDEKI;HIRATE NAOYUKI;YABUKI MOTOHISA
分类号 G01N1/28;H01L21/66 主分类号 G01N1/28
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