发明名称 PRODUCTION OF THIN FILM HEAD
摘要 PURPOSE:To obtain a thin film magnetic head having excellent magnetic characteristics by subjecting an inter-layer insulating film formed of an inorg. material to precision polishing to eliminate steps and removing the angle parts on the edge face of a return path part by mechanochemical polishing. CONSTITUTION:Grooves 2 are provided on the surface of an Ni-Zn ferrite substrate 1 and glass is packed as a nonmagnetic material 3 therein. After the surface is subjected to the mechanochemical polishing, a thin film conductor coil 4 is sputtered on the surface thereof. SiO2 is then sputtered as the inter- layer insulating film 5 and is subjected to diamond polishing to <=500Angstrom , by which said film is flattened. The return path part 6 is formed thereon. The entire surface is thereafter subjected to the mechanochemical polishing to <=30Angstrom surface roughness. A main magnetic pole 7 and thick-film main magnetic pole 8 consisting of amorphous Co are then sputtered and a protective film 9 consisting of Al2O3 is deposited thereon. Edge rising of the path part 6 is thus eliminated and the thin film head having high efficiency and excellent magnetic characteristics is obtd.
申请公布号 JPS63195815(A) 申请公布日期 1988.08.12
申请号 JP19870028694 申请日期 1987.02.09
申请人 SUMITOMO SPECIAL METALS CO LTD 发明人 WADA TOSHIAKI;MURATA AKIO
分类号 G11B5/31;G11B5/127 主分类号 G11B5/31
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