发明名称 HIGH BREAKDOWN-VOLTAGE PLANAR TYPE SEMICONDUCTOR ELEMENT
摘要 PURPOSE:To short-circuit a gate and a cathode in an element, and to prevent the large deterioration of trigger sensibility by forming a layer having the same conductivity type as a second base layer, surrounding the second base layer, to which the element is shaped, and bringing a cathode electrode into low-resistance contact with the layer. CONSTITUTION:A p-type layer 16 is isolated and shaped, surrounding a second base layer 3, and a cathode electrode 7 is brought into low-resistance contact with the p-type layer. According to the example, large displacement currents generated from a junction terminal section are discharged to the outside from the cathode electrode 7 brought into low-resistance contact with the p-type layer 16 even when OFF voltage having a large rate-of-rise is applied under an OFF state, thus preventing the generation of the break-through of an element. The p-type layer 16 and the second base layer 3 are isolated completely, thus obviating the short circuit of a second emitter layer 4 in an MIS-GTO and the second base layer 3, then generating no deterioration of trigger sensibility.
申请公布号 JPS63194366(A) 申请公布日期 1988.08.11
申请号 JP19870026234 申请日期 1987.02.09
申请人 TOSHIBA CORP 发明人 SHINOHE TAKASHI;NAKAGAWA AKIO
分类号 H01L29/68;H01L29/739;H01L29/745;H01L29/78 主分类号 H01L29/68
代理机构 代理人
主权项
地址