| 摘要 |
PURPOSE:To enable a thetaZ stage to have an improved rigidity as a system and to have high aligning accuracy, high productivity and high versatility, by provid ing means for locking an object to be exposed after the object to be exposed is moved under control, CONSTITUTION:A wafer chuck WC is carried on a stage thetaZ and a wafer WF is fixed thereon by suction in a similar manner as the reticle side. After align ment, a lock pad PR is fixed to a stage substrate WP by a vacuum through a nipple NP. Since the lock pad PR is connected to the wafer chuck WC by a plate spring PL, the wafer chuck WC is consequently fixed to the thetaZ stage substrate WP. Some deviation (in locking) may occur when the wafer chuck WC is fixed to the thetaZ stage substrate WP. Such deviations possibly occurring in locking operation are previously measured and a tendency found therein is stored, so that said deviation can be corrected before performing the locking operation. |
