| 摘要 |
PURPOSE:To obtain a mask membrane having a flatness as desired, by changing attracting forces applied by solenoid coils to various parts of a mask frame to which the mask membrane is attached, so as to remove component materials deteriorating the flatness of the mask membrane. CONSTITUTION:A mask frame 2 is moved close to a mask holder 3, so that the mask holder is attracted by permanent magnets 4a, 4b, 4c and 4d. After being attracted, the flatness of a mask membrane 1 has a fixed value. If data of deflection configurations of the mask membrane 1 are previously obtained from a flatness measuring interferometer system, it can be known which parts of the mask membrane are projected and which parts are recessed when the holder 3 is attracted by the magnets. Thus, the flatness of the mask membrane can be corrected, based on these data, by supplying respective solenoid coils 5a, 5b, 5c and 5d with currents controlled indenpendently through respective leads 6a, 6b, 6c and 6d. By this correction, any component material deteriorating the flatness of the mask membrane are removed and the flatness as desired can be obtained. |
