发明名称 |
PHOTORESIST STRIPPER COMPOSITION |
摘要 |
A photoresist stripper composition comprises a mixture of (a) pyrrolidone, N-substituted pyrrolidones, butyrolactone or caprolactone as the major component and (b) from about 2 to about 10 percent by weight of a tetraalkylammonium hydroxide or a trialkylaralkylammonium hydroxide. Optional components of the mixture include surfactants, diluents and metal corrosion inhibitors. Extraneously added water is avoided. The compositions are efficient in stripping photoresists which, by reason of processing conditions, have become highly cross-linked and resistant to removal by solvents other than hot phenolic or halohydrocarbon strippers. |
申请公布号 |
WO8805813(A1) |
申请公布日期 |
1988.08.11 |
申请号 |
WO1987US02291 |
申请日期 |
1987.09.10 |
申请人 |
MACDERMID, INCORPORATED |
发明人 |
MARTIN, THEODORE, A., JR.;BACH, WOLF |
分类号 |
C11D7/06;C11D7/26;C11D7/32;C11D7/50;G03F7/42;(IPC1-7):C11D7/06 |
主分类号 |
C11D7/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|