发明名称 WET-PROCESS STACK GAS PURIFICATION METHOD AND APPARATUS.
摘要 <p>Wet-process stack gas cleaning method and appts. use a 1st cleaning section provided with a level maintenance system for keeping the level of a 1st cleaning soln. constant; a stack gas introduction pipe which extends below the surface of the 1st cleaning soln. and is fitted with a gas dispersion system; and a cleaning tower in which stack gas cleaned in the 1st cleaning section is brought into counter-current contact with a 2nd cleaning soln.; 1st cleaning soln. exhausted by the level maintenance system is recirculated to the stack gas introduction pipe and the 2nd cleaning soln. is circulated into the cleaning tower again following contact with gas.</p>
申请公布号 EP0277246(A1) 申请公布日期 1988.08.10
申请号 EP19870904946 申请日期 1987.07.27
申请人 CHIYODA CHEMICAL ENGINEERING & CONSTRUCTION COMPANY LIMITED 发明人 WAKUI, HITOSHI;KIYOHARA, NOBUO;NISHINO, HARUO;YAMAMOTO, OSAMU
分类号 B01D47/00;B01D47/02;B01D47/12;B01D53/34;B01D53/77;G21F9/00;G21F9/02;(IPC1-7):B01D53/34 主分类号 B01D47/00
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