| 摘要 |
PURPOSE:To shorten time for preparing a pattern for LSI lithography, by preparing the pattern data for LSI lithography for drawing a pattern with a charged particle beam based on LSI design data by using a plurality of operating devices in parallel. CONSTITUTION:The data for an LSI stored in a design-data memory device 2 are divided into fields with a field dividing device 2. The data are stored in a field-data memory devices 3. The fields, which are stored in the devices 3, are divided with a sub-field dividing device 4. The data are stored in sub-field memory devices 5. The data in the devices 5 are stored in field storing devices 6. Thereafter, the data are read and inputted into a plurality of, i.e. l units of graphic operating devices 7. The data are converted into the data formats of a pattern to be drawn. The results are stored in first-lth pattern-data memory devices 8. The data of the devices 8 are inputted into an output data memory device 10 through a transfer device 9. The processing time is shortened by performing the field dividing in the devices 3 and 4 during the operation of the devices 7.
|
