发明名称 OPEN-CLOSE STRUCTURE OF OPENING SECTION OF CHAMBER FOR DRY PROCESS SEMICONDUCTOR PRODUCTION DEVICE
摘要 <p>PURPOSE:To equalize the conditions of the inner wall of an opening section by conforming the shape of the inserting inner end surface of a block cover arranged to the opening section communicated with the outside in an inserting and detaching-free manner to the shape of the inner circumferential surface of a chamber and mounting the block cover to a parallel link disposed in a derricking-free manner toward the opening section. CONSTITUTION:An opening section 22 communicated with the outside is formed to a chamber 20, a block cover 30 is arranged to the opening section 22 in an inserting and detaching-free manner and the shape of the inserting inner end surface (a) of the block cover 30 is conformed to the shape of the inner circumferential surface (b) of the chamber 20 and shaped, and a parallel link B is disposed in a derricking-free manner toward the opening section 22 and the block cover 30 is set up to the parallel link B. Accordingly, the block cover 30 is moved in the direction of the opening section 22 by the parallel link B and opens and closes the opening section 22, and the shape of the inserting inner end surface (a) of the block cover 30 is conformed to the shape of the inner circumferential surface (b) of the chamber 20 and formed, thus equalizing the conditions of the inner wall of the chamber 20.</p>
申请公布号 JPS63192222(A) 申请公布日期 1988.08.09
申请号 JP19870025404 申请日期 1987.02.04
申请人 KOKUSAI ELECTRIC CO LTD 发明人 MAKIGUCHI KAZUMASA;YOKOMIZO ISAO;MATSUMOTO OSAMU;ENDO YOSHIHIDE
分类号 H01L21/302;H01L21/02;H01L21/205;H01L21/3065;H01L21/31;H01L21/677;H01L21/68 主分类号 H01L21/302
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