| 摘要 |
PURPOSE:To implant ions by setting an angle with high accuracy by mounting a platen consisting of a holding mechanism holding a wafer between a base member and a fixing member and a rolling mechanism turning the wafer together with the holding mechanism. CONSTITUTION:A holding mechanism 10 placing a wafer 8 on a base member (a platen cup 26) and elevating and lowering the wafer and holding the wafer 8 between the base member and a fixing member (a clamping ring 30) and a rolling mechanism 23 (bearings 24, 34, gears 42, 48 and a motor 44) rotating the wafer 8 held to the holding mechanism 10 together with the holding mechanism 10 are installed. Accordingly, the wafer B placed onto the base member is held between the base member and the fixing member by the ascent and descent of the wafer by the holding mechanism 10, and turned by the rolling mechanism 23 together with the holding mechanism 10 under a held state, and the wafer 8 can be sustained at a fixed angle. |
