| 摘要 |
PURPOSE:To improve bonding properties among heavy metallic X-ray absorption patterns and a mask substrate, to decrease pattern defects and to lengthen a lifetime by joining and forming carbide layers while each being cemented among the heavy metallic X-ray absorption patterns and the mask substrate in a mask for X-ray exposure consisting of a carbon system. CONSTITUTION:A mask substrate 2 composed of an silicon carbide film shaped onto a ring-shaped housing 1, X-ray absorption patterns 3 made up of tungsten, and carbide layers 4, which are formed joined among the mask substrate 2 and the X-ray absorption patterns 3 respectively and shaped by changing tungsten into carbide, are formed. The absorption patterns are attached to the mask substrate by strong adhesion by the cohesive energy of the carbide layers 4, thus forming a mask for X-ray exposure from which the patterns are difficult to be peeled. |
