| 摘要 |
PURPOSE:To produce the title high-purity and high-quality fine glass-particle deposit by specifying the exhaustion amt. of the exhaust duct of a reaction vessel and the cross-sectional area of a duct opening when the fine glass-particle deposit as the optical fiber base material is formed by hydrolyzing a raw gas with a burner flame in the reaction vessel. CONSTITUTION:The gaseous H2 and gaseous O2 as the combustion gases and the gaseous SiCl4 as the raw material for glass are injected into the reaction vessel 1 from a burner 3, and the gaseous SiCl4 is hydrolyzed and oxidized by the combustion of H2 and O2 in the burner 3 to form the deposit 2 of the fine SiO2-based particles. In this case, the exhaustion amt. of the exhaust duct 4 of the reaction vessel 1 is made 1-5 times greater than the amt. of the gas injected from the burner 3, and the opening cross-sectional area S0 is made 0.5-10 times greater than the cross-sectional area S1 of the fine glass-article deposit 2. The turbulence of a gas current and disturbance of a burner flame in the reaction vessel are reduced, the cracking after sintering and the rate of the remaining cells are also reduced, and the high-purity and high-quality fine glass-particle deposit 2 for an optical fiber base material can be obtained. |
