| 摘要 |
PURPOSE:To average the local erosion of a target and to improve the utilizing efficiency thereof by disposing an auxiliary magnetic field generator between magnetic poles of plural magnets for generating a main magnetic field on the rear face of the target of a magnetron sputtering device. CONSTITUTION:A cathode 11 for magnetron sputtering is constituted of a target plate 12 and a main magnetic field generator 13 provided on the rear face thereof. The main magnetic field generator 13 is constituted by disposing a bar-shaped central magnet 15 at the center of a circular supporting plate 14 and disposing an annular outer circumferential magnet 16 around said magnet. The auxiliary magnetic field generator 17 disposed with annular 1st-3rd auxiliary magnets 19-21 on the annular supporting plate 18 is disposed between the two magnets 15 and 16 concentrically with the main magnetic field generator 13. The target A in the upper part of the auxiliary magnetic field 32 by the auxiliary magnetic field generator 17 is sputtered as well by said auxiliary magnetic field, by which the part of the target 12 for forming the thin film is increased by as much as A and the utilizing efficiency of the target 12 is improved.
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