发明名称 POWER SUPPLY DEVICE OF APPARATUS FOR FORMING THIN FILM
摘要 PURPOSE:To prevent sputtering by arc discharge from degrading the quality of a thin film by constituting a power supply circuit of a sputtering device of a rectifier circuit of an AC power source, smoothing circuit, filter circuit and series resistance to load. CONSTITUTION:Glow discharge by an inert gas is generated between the target and substrate in the sputtering device 6 and the thin film of the target material is formed on the substrate surface. The power supply 1 of this device is constitute of a transformer 2 which boosts commercial AC, the current rectifier circuit 3 which converts high-voltage AC to DC,the smoothing circuit 4 which converts the rectified pulsating current to ordinary DC, the filter circuit 5 which absorbs the surge current when an arc spot is generated and the resistor 7 connected in series to the sputtering device 6 as the load. An inverted L-shaped circuit consisting of a resistor 51 and a capacitor 52 is used for the filter circuit 5 or a choke coil is used in the inverted L- or T-shaped circuit in place of the resistor 51. The smoothing circuit 4 is constituted of the inverted L-shaped circuit consisting of the choke coil 41 and the capacitor 42 or the circuit connected with plural high-capacity capacitors in parallel.
申请公布号 JPS63190168(A) 申请公布日期 1988.08.05
申请号 JP19870021326 申请日期 1987.01.30
申请人 SUMITOMO ELECTRIC IND LTD 发明人 IHARA HIROHIKO;IGARASHI TADASHI
分类号 H01L21/285;C23C14/34;H01L21/203 主分类号 H01L21/285
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