| 摘要 |
PURPOSE:To improve effective sensitivity of a resist, by providing a lithographic mask structure, and X-ray and ultraviolet-ray radiation means in which X rays and ultraviolet rays are made to pass through this structure so as to perform pattern radiation on the lithographic resist. CONSTITUTION:A piece of lithography is equipment composed of an X-ray radiation means 1, an ultraviolet-ray radiation means 2a, 2b, and a lithographic mask structure 6 which is formed as follows: a patterned mask material 4 serving as an X-ray absorber is disposed on a mask material holding thin film 5 which is held on an annular holding substrate 3 and transmits X rays and ultraviolet rays. A lithographic resist structure which is formed by laminating a resist 8 on a laminate 7 is disposed to be irradiated with X rays and ultraviolet rays through the lithographic mask structure 6. When patterns are formed on the resist by the use of such a lithography equipment, lithography excellent in its effective sensitivity can be realized.
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