Composition for use in the processing of semiconductor materials and method for its preparation and use.

摘要

A storable semiconductor cleaning solution consists essentially of sulphuric acid at a concentration of from 30% to 70% and hydrogen peroxide at a concentration of from 1% to 20% preferably also containing a pentavalent phosphorus sequestrant and tin ions. The solution is produced by diluting concentrated sulphuric acid, ageing the diluted acid until it reaches a temperature below 30 DEG C and introducing the hydrogen peroxide, preferably having a concentration of at least 70% by weight, into the aged acid and equilibrating the resulting solution. The cleaning solutions can be stored for an extended period at ambient temperature and can be used to clean semiconductors, and with suitable precautions aluminised semiconductors, at temperatures below 100 DEG C.