发明名称 |
VAPOR SYNTHESIS DEVICE FOR CARBON FILM |
摘要 |
PURPOSE:To maintain the temp. of a substrate at a prescribed and uniform temp., by using a material which absorbs microwaves and can be heated up to a specific temp. when energized to constitute an imposing plate to be imposed with the substrate. CONSTITUTION:The substrate 4 is imposed on the imposing table 5 in a reaction vessel 3 and a gaseous mixture composed of hydrocarbon and hydrogen is supplied into the vessel from a supply pipe 6 and is discharged from a discharge pipe 7 to maintain the specified pressure in the vessel 3. The microwaves generated in a microwave oscillator 1 is then fed through a waveguide 2 to the inside of the vessel 3 to convert the gaseous mixture to plasma. The substrate 4 and the sample plate 5 are then heated by microwaves and the plate 5 is further supplied with the electric power from a power source 9 to cause the self-heat generation. The sample plate 5 is formed of a material (SiC, etc.) which has the property as the electric material to absorb the microwaves and has the property as an electric resistor to permit heating up to 500-1,000 deg.C when energized. The easy temp. control of the plate 5 is thereby permitted.
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申请公布号 |
JPS63186874(A) |
申请公布日期 |
1988.08.02 |
申请号 |
JP19870019483 |
申请日期 |
1987.01.29 |
申请人 |
DENKI KOGYO KK;SEIKO INSTR & ELECTRONICS LTD |
发明人 |
ISHIHORI KOUICHI;YAMAMOTO MANTARO;KURIHARA MISAO;MORIYA TSUTOMU |
分类号 |
C01B31/04;C23C16/26;C23C16/27;C23C16/50;C23C16/511;C23C16/52;C30B29/04 |
主分类号 |
C01B31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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