| 摘要 |
PURPOSE:To polish a polished article without generating scratch flaws and extremely suppress the consumed quantity of the abrasive grain slurry by dispersing and holding the silicon carbide fine needle-shaped crystals into the fine three-dimensional network structure of a specific porous elastic body. CONSTITUTION:A buffing material is prepared uniformly dispersing and holding the fine needle-shaped silicon carbide crystals in a range of volume mixing rate of 0.5-10% for a buffing basic material into the fine three dimensional network structure of a polyvinyl acetal group porous elastic body. The fine needle-shaped silicon carbide crystal in the buffing material is extremely hard, and the surface of a polished member can be polished without generating scratch flaws. Therefore, the buffing material itself develops the superior polishing force, and the consumed quantity of the abrasive grain slurry supplied from outside can be suppressed to an extremely low value.
|
