发明名称 PRODUCTION OF NITRIC ACID BY PHOTOCHEMICAL REACTION
摘要 PURPOSE:To produce nitric acid in excellent workability at a low cost, using a raw material abundant in atmosphere, by introducing high-intensity hard X-ray into an atmosphere containing O2, N2 and steam and carrying out photochemical reaction under normal temperature and pressure condition. CONSTITUTION:A hard X-ray having an energy E of 4-25keV and an intensity of about 10<16> photons/sec/(mrad)<2>, e.g. a synchrotron radiation is introduced through a vacuum pipe 1 and a Be window 3 into a chamber 4. Separately, a gaseous mixture of O2, N2 and steam produced by passing O2 gas of an O2 bomb 5 and N2 gas of an N2 bomb 6 into a water container 7 is introduced through a gas inlet port 10 into the chamber 4 and subjected to photochemical reaction under normal temperature and pressure condition to fix N2. The obtained nitric acid 9 is discharged from an outlet 11 and collected in a nitric acid container 8.
申请公布号 JPS63185805(A) 申请公布日期 1988.08.01
申请号 JP19870017357 申请日期 1987.01.29
申请人 NEC CORP 发明人 MIZUKI JUNICHIRO;AKIMOTO KOICHI
分类号 B01J19/12;C01B21/30;C01B21/40 主分类号 B01J19/12
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