摘要 |
A high density optical detector mosaic array assembly has a plurality of interconnect locations comprised of IC readout pads (40) in a pattern suitable for interconnecting a plurality of integrated circuit devices (30). The assembly comprises a substrate (20), a plurality of thin film metallization layers alternating with a plurality of thick film dielectric layers wherein the first of the thin film layers (52) is deposited directly on the substrate (20) and is delineated to form a plurality of interconnect lines (54) disposed in a pattern suitable to form a first row of the detector mosaic (10) at a first edge of the assembly and terminating at an interconnect location (56). Terminal pads (58) are applied to each such interconnect line (54) and the first thick film dielectric layer (60) is deposited over the thin film interconnect line (54) such that only the terminal pads (58) are left exposed. Each alternating layer of thick film and thin film layers are similarly disposed to form a complete interconnect pattern suitable for interconnecting with the integrated circuit devices (30) and a plurality of detector rows forming the detector mosaic interconnect lines. Bonding pads (80) are applied to the detector mosaic (10) such that the fill factor for detectors is about 100% for bonding pads on centers in the range of about 25 micrometers. |