| 摘要 |
PURPOSE:To reduce interferences among a chemical tank conducting washing, a condensing tank performing drying and a carrier for loading a wash with a partition wall at the time of washing, drying and load ing, and to improve the efficiency of washing and drying and minimize the consumption of chemicals by mounting the chemical tank and the condensing tank regarding a production device for a semiconductor device and setting up the carrier. CONSTITUTION:The vapor of chemicals is generated by heating chemicals 3 stored in a lower section in a chemical tank by using a heater 2 and a wash is washed in the chemical tank 1. A carrier 9 for loading a wash with a partition wall and the wash are positioned at a position A at that time, a communicating port 14 is closed by an upper partition wall 10, and the chemical tank 1 is separated from a condensing tank 8, thus leaking no vapor of chemicals, then resulting in efficient washing. The condensing tank 8 having several cooling water paths 4 along its own inner wall is positioned at the upper section of the chemical tank 1, thus downward dropping chemicals remaining on the surface of the wash, then drying the wash. The wash and the carrier 9 are dried at a position B in the condensing tank 8. The condensing tank 8 is isolated from the chemical tank 1 in a lower section by a lower partition wall for the carrier 9, thus resulting in efficient drying.
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