PRODUCTION OF THIN FILM OF HYPERFINE PARTICLES

摘要

PURPOSE:To produce a thin film of hyperfine particles having a large specific surface area under satisfactory control of film thickness by forming hyperfine particles by a vapor phase chemical reaction in a reaction chamber under reduced pressure and by depositing the formed particles on a substrate kept at a temp. below the reaction temp. CONSTITUTION:When a thin film of hyperfine TiO2 particles is produced by this invention, hyper fine TiO2 particles are formed with TiCl4 as a gaseous starting material, O2 as a reactive gas and N2 as a carrier gas at 900 deg.C reaction temp. under 10Torr pressure and the formed particles are deposited on an Si substrate kept at 200 deg.C. A thin film of hyperfine TiO2 particles having about 2,000Angstrom thickness is obtd. by deposition for 60min. The particle size of the particles in the film is about 500Angstrom . The particles formed under the reduced pressure are much smaller than particles formed under atmospheric pressure.