ETCHING METHOD AND PLUSH CLOTH FOR ETCHING

摘要

PURPOSE:To prevent side etching and to form a prescribed pattern by satisfactory etching by bringing a prescribed laminated substrate into contact with an etching soln. and brushing the surface of the substrate with plush cloth wetted with the etching soln. CONSTITUTION:A layer 2 to be etched is laminated on the surface of a substrate 1 and a thin resist layer 3 having a desired pattern is laminated on the surface of the layer 2. The laminated substrate 4 is brought into contact with an etching soln. 12 and the surface of the substrate 4 on the resist layer 3 side is brushed with plush cloth 13 having many implanted fibers wetted with the etching soln. 12. The part of the layer 2 not covered with the resist layer 3 is removed by etching to form the desired pattern.