| 摘要 |
PURPOSE:To provide a thin hard film combining high hardness with high toughness and excellent in adhesive strength to base material, by constituting a thin hard film of specific percentages of cubic BN and the borides, nitrides, or carbides of the elements of groups IVa, Va, and VIa. CONSTITUTION:This thin hard film consists of, by weight, 85-97% cubic BN (CBN) and 15-3% of borides, nitrides, or carbides of one or more kinds among the elements of groups IVa, Va, and VIa of the periodic table. In order to obtain this thin hard film, one or more kinds among the elements of groups IVa, Va, and VIa and B are simultaneously evaporated in an atmosphere containing at least N2 to undergo reactive vapor deposition onto a material to be treated. It is necessary to regulate the ratio between the above CBN and the above borides, nitrides, or carbides (internal stress relaxation components) to a value in the above range, and film hardness is deteriorated when CBN content is less than 85%. On the other hand, effects of functions such as internal stress relaxation, improvement in toughness, etc., cannot be obtained when CBN content exceeds 97%, because the amounts of internal stress relaxation components are too small.
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