STRIPPING AGENT FOR WATER SOLUBLE RESIST FILM

摘要

PURPOSE:To improve the release property of a water soluble resist film and to suppress corrosion of a plating film by using a stripping agent contg. NaOH and/or KOH and reducing material. CONSTITUTION:The stripping agent consists of an aq. soln. contg. 20-50g/l NaOH and/or KOH and 0.01-0.3mol./l reducing material (e.g.: inorg. reducing material such as Na2SO3). A substrate on which the water soluble resist film is formed is immersed into the above-mentioned stripping agent. The resist film is stripped by such a method of spraying the stripping agent to the substrate on which the resist film is formed. Further, 0.0001-0.05mol./l sodium aryl sulfonate (e.g.: sodium p-phenol sulfonate) and/or sulfur compd. (e.g.: thiourea) may be added to the stripping agent having the above-mentioned constitution.