<p>Polymeric materials useful as positive resists comprise a backbone formed from an addition polymer which is degradable by radiation and at least 3 pendant polymeric groups which show no appreciable positive resist characteristics. Preferably these materials comprise a backbone which is a polymethacrylate ester and from 3 to 5 pendant polystyrene groups. These polymers exhibit increased sensitivity and resistance to plasma processing and provide resists which are useful as components of integrated circuits.</p>
申请公布号
EP0276108(A2)
申请公布日期
1988.07.27
申请号
EP19880300369
申请日期
1988.01.18
申请人
NATIONAL RESEARCH DEVELOPMENT CORPORATION
发明人
AFFROSSMAN, STANLEY;BAKHSHAEE, MASSOUD;PETHRICK, RICHARD ARTHUR;SHERRINGTON, DAVID COLIN