发明名称 |
Water-developable photosentitive resin composition, and resin or printing plate therefrom. |
摘要 |
<p>Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises: (i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60 to 130 DEG C (ii) a polymerizable monomer, and (iii) a photopolymerization initiator. e</p> |
申请公布号 |
EP0276093(A2) |
申请公布日期 |
1988.07.27 |
申请号 |
EP19880300311 |
申请日期 |
1988.01.15 |
申请人 |
NIPPON PAINT CO., LTD. |
发明人 |
KIMOTO, KOICHI;UMEDA, YASUSHI;KAWAGUCHI, CHITOSHI;KAWANAMI, TOSHITAKA |
分类号 |
G03F7/033 |
主分类号 |
G03F7/033 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|