发明名称 Water-developable photosentitive resin composition, and resin or printing plate therefrom.
摘要 <p>Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises: (i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60 to 130 DEG C (ii) a polymerizable monomer, and (iii) a photopolymerization initiator. e</p>
申请公布号 EP0276093(A2) 申请公布日期 1988.07.27
申请号 EP19880300311 申请日期 1988.01.15
申请人 NIPPON PAINT CO., LTD. 发明人 KIMOTO, KOICHI;UMEDA, YASUSHI;KAWAGUCHI, CHITOSHI;KAWANAMI, TOSHITAKA
分类号 G03F7/033 主分类号 G03F7/033
代理机构 代理人
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