EXPOSURE ARRANGEMENT FOR THE PRODUCTION OF MASKS

摘要

An exposure arrangement for use in a computer-aided design system to produce masks. The arrangement includes a cathode-ray tube which produces an image of the mask on the screen of the tube, and an optical system which projects the image of the mask onto a substrate which is to be exposed. The cathode-ray tube is a high-brightness tube in which the screen is provided with a phosphor which emits in an ultraviolet spectrum and with a cooling circuit for the phosphor. The optical system is designed for use in the ultraviolet spectrum and operates on the ultraviolet image provided by the screen of the high-brightness tube.