| 摘要 |
PURPOSE:To easily form a highly precise black matrix pattern by using a specific material for the photo-resist film of a color cathode-ray tube formed with the photo-resist film and a nonluminous light absorbing film. CONSTITUTION:A photo-resist solution used to form a photo-resist film is constituted of at least the phosphate of a formalin condensation product of diazodiphenylamine, 2.5-bis (4'-azide-2'-sulfobenzylidene) cyclopentanone and its saline, polyvinyl alcohol, and polyvinyl pyrrolidone, thereby a reciprocity law failure phenomenon and the adhesive force between the photo-resist film and a faceplate can be utilized, thus a highly precise black matrix pattern is formed in a short time.
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