发明名称 Pressure contact type semiconductor device
摘要 A method of manufacturing the present invention relates to a semiconductor device by providing a projection formed by pressing the side wall portion of a metal cylindrical body from the outside toward the inside of the cylindrical body and engaging the outer peripheral edge of the upper surface of the cylindrical elastic member contained in the cylindrical body with the projection.
申请公布号 US4760037(A) 申请公布日期 1988.07.26
申请号 US19860914575 申请日期 1986.10.03
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 OHDATE, MITUO
分类号 H01L21/60;H01L23/049;H01L23/48;(IPC1-7):H01L23/02 主分类号 H01L21/60
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