| 摘要 |
<p>PURPOSE:To enhance the effective sensitivity of a photosensitive material by installing a fluorescent-substance retaining structure which is arranged between a means to generate an illuminating beam and a mask structure for lithography and which includes a fluorescent substance and a fluorescent-substance retaining thin film. CONSTITUTION:A fluorescent-substance retaining thin film 2 composed of polyethylene terephthalate is pasted to a ring-shaped retaining substrate 1; a fluorescent substance (e.g., BaSi2O5+Pb) 3 is evaporated onto the film. By this process, a fluorescent-substance retaining structure 3a is formed. The fluorescent- substance retaining structure 3a is attached to an X-ray source window 4, composed of beryllium, which is situated between an X-ray source 4a and a mask structure 10a. After a wafer 12 has been coated with a resist 11, the assembly is pre-baked. While a proximity gap between a mask-retaining thin film 9 and the resist 11 is kept at about 10 mum, the assembly is exposed. By this setup, it is possible to enhance the effective photosensitivity of the resist 11.</p> |
