| 摘要 |
<p>PURPOSE:To prevent a workpiece from being subjected to any damage by mixing at least sodium hypochlorite, sodium tripolyphosphate and sodium sulfate into water, in the case of a polishing liquid used for polishing the mirror-like surface of substrates made of monocrystal of gallium arsenide. CONSTITUTION:The mirror-like surfaces of a plurality of substrates 2 made of monocrystal of gallium arsenide and stuck to a polishing jig 1 are polished by means of polishing liquid consisting of about 20g of sodium hypochlorite, about 6.4g of sodium tripolyphosphate, about 7.2g of sodium sulfate and about 500ml of pure water. In this case, a film consisting of Ga2O3, As2O3 is formed as a reaction product 3 on the surface of gallium arsenide 2 by aid of ClO<-> generated through dissociation of sodium hypochlorite in pure water, the protruding portions of the reaction product 3 are swept off by polishing cloth 4 to get the surface of the gallium arsenide 2 exposed and a reaction product 5 is formed again. These processes are repeated alternately to carry out flat and smooth mirror-like surface polishing. A polishing process of high accuracy can be carried out in this way, without giving any damage to a workpiece.</p> |
