发明名称 TREATMENT OF PHOTOSENSITIVE COATING LIQUID
摘要 PURPOSE:To extinguish and dissolve air bubble contained into the titled liq. by introducing the titled liq., from which the dissolved oxygen is removed, to a retention part and prolong retention time in the retention part while pressurizing the titled coating liq. in the retention part. CONSTITUTION:The photosensitive coating liq. 33a is supplied from a liq. inlet 8a, introduced to an inlet 9a of tube, arrives at an outlet 9b of module 9 and the dissolved oxygen contained in the liq. 33a is deaerated while the liq. passes through each tube. The dissolved air, which is deaerated while the liq. passes through the module 9, reduces the degree of vacuum of the pressure reducing chamber 10. But at that time, the pressure of the pressure reducing chamber 10 is kept at the desired degree of vacuum by detecting the degree of vacuum with a pressure sensor 13 and actuating a vacuum pump 12 with a control circuit 14. The blister generation after forming of the film is prevented by the obtained photosensitive coating liq. with the dissolved air deaerated.
申请公布号 JPS63178843(A) 申请公布日期 1988.07.22
申请号 JP19870008322 申请日期 1987.01.19
申请人 FUJI PHOTO FILM CO LTD 发明人 INUKAI YUZO
分类号 B01J19/00;B01D19/00;B05D1/00 主分类号 B01J19/00
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