发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To make a drying stage unnecessary by incorporating a specified polyvinyl alcohol copolymer, a polymerizable monomer having a radical- polymerizable ethylenic double bond and a photopolymn. initiator. CONSTITUTION:This photosensitive resin compsn. contains a water soluble or water dispersible polyvinyl alcohol copolymer having 50-70mol.% degree of saponification of vinyl ester units and 60-130 deg.C heat melting and flowing start temp., a polymerizable monomer having a radical-polymerizable ethylenic double bond and a photopolymn. initiator. The polyvinyl alcohol copolymer is obtd. by saponifying a copolymer consisting of 0.1-20mol.% in total of 0.1-20mol.% nonionic monomer radical-copolymerizable with vinyl ester and 0-10mol.% monomer having an ionic hydrophilic group and the balance vinyl ester. When the photosensitive resin compsn. is used, a drying stage is made unnecessary, a large-scale apparatus is not required and the number of stages can be reduced.
申请公布号 JPS63177127(A) 申请公布日期 1988.07.21
申请号 JP19870008810 申请日期 1987.01.17
申请人 NIPPON PAINT CO LTD 发明人 UMEDA YASUSHI;KAWAGUCHI CHITOSHI
分类号 C08F2/48;C08F2/44;C08F20/10;C08F20/26;C08F20/28;G03F7/027;G03F7/028;G03F7/032;G03F7/033;G03F7/038 主分类号 C08F2/48
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