| 摘要 |
PURPOSE:To suppress the variation of the dimensions of the apertures of the photodetecting parts of a light shielding film and suppress noises caused by the variation of photosensitivities among a plurality of solid state image sensing devices or in one solid state image sensing device by a method wherein the edge of the aperture of the light shielding film is defined by the edge of a side wall which is used as a part of the light shielding film and formed along the step produced at the time of the formation of an insulating film. CONSTITUTION:The aperture 25 of a light shielding film 13 is formed by dry- etching with a photoresist film which is so patterned as to make the edge of an aperture pattern come on a side wall 19 as a mask. The dimension of the aperture 25 of the light shielding film 13 is determined in a self-aligning manner by the position of the inner edge (x) of the side wall 19. Therefore, the variation of the dimensions of the respective apertures of the light shielding film 13 can be reduced significantly and, as a result, noises caused by the variation of photosensitivities, which is a problem in a conventional constitution, can be suppressed. |
