发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To eliminate the need for a drying stage by incorporating a specific polymerizable monomer and photopolymn. initiator into a PVA copolymer obtd. by saponifying a copolymer of vinyl ester and ionic hydrophilic group- contg. polymerizable monomer. CONSTITUTION:The polymerizable monomer having the compd. expressed by formula I and having at least two free hydroxyl groups and the photopolymn. initiator are incorporated into the water soluble or water dispersible PVA copolymer which is obtd. by saponifying the copolymer of 90-99mol.% vinyl ester and 0.1-10mol.% ionic hydrophilic group-contg. polymerizable monomer with a vinyl ester unit and has 50-70mol.% degree of saponification and 60-130 deg.C hot melt flow initiation temp. In formula, R1, R3 and R4 are respectively the same and different and denote a hydrogen atom or methyl group, R2 denotes an alkylene group of 1-5C having a hydroxyl group, R5 denotes an alkyl group of 1-5C having a hydroxyl group, (n) denotes 4-23 integer, (m) denotes 0 or 1 and (p) denotes 1-5 integer.
申请公布号 JPS63177125(A) 申请公布日期 1988.07.21
申请号 JP19870008813 申请日期 1987.01.17
申请人 NIPPON PAINT CO LTD 发明人 KIMOTO KOICHI;UMEDA YASUSHI
分类号 C08F2/48;C08F2/44;C08F20/10;C08F20/26;C08F20/28;C08F20/52;C08F220/28;C08F220/58;C08F290/00;C08F299/02;G03F7/027;G03F7/032;G03F7/033;G03F7/038 主分类号 C08F2/48
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