| 摘要 |
PURPOSE:To fix the component ratio of halogen gas constituting a laser gas at an excimer laser unit to other gases by installing a means to alternately repeat a first process to introduce a specific amount of gas into the excimer laser unit and a second process to discharge the specific amount of gas to the outside of a closed room. CONSTITUTION:A means to alternately repeat the following two processes is installed at a gas processor 2 used for a rare-gas halide excimer laser: a first process to introduce a gas of a number of nO and a new number (2XnH+nO) during a unit time t0 into an excimer laser unit 1 capable of oscillating an excimer laser when the number of halogen molecules being introduced into and removed from the gas processor 2 during said unit time t0 is set to nH and the number of molecules not being removed by the gas processor 2 is set to nO; a second process to discharge the gas having a number (nH+nO) being introduced into the gas processor 2 during said unit time t0 to the outside of a closed room composed of the excimer laser unit 1 and the gas processor 2. By this setup, the component ratio of gases becomes definite and it is possible to obtain a laser output without fluctuation. |
