发明名称 |
Process for removing silicon tetrafluoride from gaseous boron trifluoride |
摘要 |
Silicon tetrafluoride is removed from gaseous boron trifluoride by treating the gas in a first stage at temperatures of from 10 to 60@C with a solution containing from 55 to 70% by weight of dissolved boron trifluoride. From this stage there is drawn off an exit gas which comprises practically pure silicon tetrafluoride and also a boron trifluoride-enriched solution from which boron trifluoride is desorbed at temperatures of from 90 to 200@C.
|
申请公布号 |
DE3700244(A1) |
申请公布日期 |
1988.07.21 |
申请号 |
DE19873700244 |
申请日期 |
1987.01.07 |
申请人 |
BASF AG |
发明人 |
HEINER,DR. REICH,HANS;LEUTNER,BERND,DR.;LUDWIG,DR. EBENHOECH,FRANZ;BRUNOLD,ANDREAS |
分类号 |
C01B33/107;C01B35/06;(IPC1-7):C01B35/06;B01D53/14;C01B33/08 |
主分类号 |
C01B33/107 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|