发明名称 Process for removing silicon tetrafluoride from gaseous boron trifluoride
摘要 Silicon tetrafluoride is removed from gaseous boron trifluoride by treating the gas in a first stage at temperatures of from 10 to 60@C with a solution containing from 55 to 70% by weight of dissolved boron trifluoride. From this stage there is drawn off an exit gas which comprises practically pure silicon tetrafluoride and also a boron trifluoride-enriched solution from which boron trifluoride is desorbed at temperatures of from 90 to 200@C.
申请公布号 DE3700244(A1) 申请公布日期 1988.07.21
申请号 DE19873700244 申请日期 1987.01.07
申请人 BASF AG 发明人 HEINER,DR. REICH,HANS;LEUTNER,BERND,DR.;LUDWIG,DR. EBENHOECH,FRANZ;BRUNOLD,ANDREAS
分类号 C01B33/107;C01B35/06;(IPC1-7):C01B35/06;B01D53/14;C01B33/08 主分类号 C01B33/107
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