METHOD AND APPARATUS FOR LITHOGRAPHIC ROTATE AND REPEAT PROCESSING

摘要

In X-ray lithography apparatus, a mask assembly (31,71) permits exposure of selected radial sectors (3, 5, 7, 9) of a semiconductor wafer (1). The mask assembly may comprise a single mask (31) having a single transmissive sector, sectors of the wafer (1) being exposed in turn by rotation of the wafer. The mask assembly may comprise a single mask (31) having a plurality of transmissive sectors, the wafer (1) being rotated relative to the mask (31) between successive exposures. When the mask assembly comprises a diaphragm having a single transmissive sector, the mask may be divided into a plurality of radial sectors each radial sector having a desired pattern thereon and the diaphragm can be rotated between successive exposures of the wafer.