发明名称 HIGH TEMPERATURE ION BEAM SOURCE
摘要 A plurality of magnetic pole pieces are arranged around the external wall of a high temperature plasma confining structure. The pole pieces are positioned between permanent magnets spaced from one another and the confining structure by distances calculated to produce a minimum field toward the center of the structure with an effective containing field around the periphery of the structure. The magnets and the pole pieces are cooled. An odd number of poles are employed such that the missing pole appears as a virtual pole at the extraction slit used for forming an ion beam for ion implantation. The resulting small package multipole plasma containment functions to provide higher beam current, longer source lifetime, higher voltage stability and reduces maintenance and cleaning operations, with the permanent magnets protected from high temperature and corrosive gases.
申请公布号 DE3176789(D1) 申请公布日期 1988.07.21
申请号 DE19813176789 申请日期 1981.09.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KELLER, JOHN HOWARD;MCKENNA, CHARLES MICHAEL
分类号 H01J27/08;H01J27/14;H01J37/08;(IPC1-7):H01J27/14 主分类号 H01J27/08
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