| 摘要 |
The subject invention relates to the fabrication of metal oxide patterns on a substrate adapted for use with thin film magnetic heads. The metal oxide pattern has a precisely defined geometry including nearly vertical side walls, for minimizing read/write errors. In addition, a filler material formed from a non-magnetic, non-metallic compound is provided on the substrate in a pattern complimentary to the metal oxide pattern. In accordance with the subject invention, the top surface of the metal oxide pattern and the filler material are co-planar. By this arrangement, subsequent layers may be uniformly deposited without discontinuities. The subject method includes a plurality of distinct masking and etching steps in order to achieve the desired result. |
