发明名称 |
Improved plasma stripper with multiple contact point cathode. |
摘要 |
<p>An improved plasma stripping apparatus with external electrodes is provided wherein the cathode (21) has multiple small area contact points adjacent and in close proximity to or uniformly touching the reactor chamber (11) to cause areas of high r.f. field densities that enhance the gas breakdown in the plasma to obtain high rate film removal.</p> |
申请公布号 |
EP0275188(A2) |
申请公布日期 |
1988.07.20 |
申请号 |
EP19880300242 |
申请日期 |
1988.01.12 |
申请人 |
OLIN CORPORATION |
发明人 |
WHITLOCK, MICHAEL GENE;LETTIRE, KEVIN CHARLES |
分类号 |
H01L21/302;C23F4/00;H01J37/32;H01L21/3065 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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