发明名称 APPARATUS FOR PLASMA VAPOR-PHASE REACTION
摘要 PURPOSE:To form uniform glow discharge, by forming one of coupled electrodes for supplying electric energy to reactive gas into a plurality of acicular structures, and providing a grid between the electrodes to enable to remove local strong discharge. CONSTITUTION:The apparatus is constituted with a reaction vessel 2 evacuated below 1 atm., a supply system for supplying reactive gas to said vessel 2, an exhaustion system and a film-forming domain between the supply and exhaustion systems. A substrate 1 having a surface on which a film will be formed is provided in said film-forming domain. Out of the first and second electrodes 3, 8 for supplying electric energy to reactive gas, the electrode 3 provided at the side of supplying said reactive gas is formed into a plurality of acicular electrodes. In addition, a grid 12 having electric conductivity and isolated from the electrodes 3, 8 is provided between the electrodes 3 and 8.
申请公布号 JPS59136475(A) 申请公布日期 1984.08.06
申请号 JP19830008168 申请日期 1983.01.21
申请人 HANDOUTAI ENERUGII KENKYUSHO:KK 发明人 YAMAZAKI SHIYUNPEI
分类号 C23C16/50 主分类号 C23C16/50
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