| 摘要 |
PURPOSE:To obtain a moisture-proof film to be formed on the surface of plastic and to improve water vapor barrier characteristics, comprising a plasma polymerization film containing sulfur and carbon in a fixed atomic ratio. CONSTITUTION:A plasma polymerization film is formed on a base material plastic in such a way that an atomic ratio of sulfur and carbon S/C of 1.5-9.0, preferably 2.0-5.0 to give the aimed moistureproof film. The thickness of the polymerization film is preferably 50-5,000Angstrom .
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