| 摘要 |
PURPOSE:To uniformly etch a sample by providing a microwave reflecting plate at a connector of a waveguide to a vacuum vessel, and rotating the sample to be etched to reduce a plasma. CONSTITUTION:A reflecting plate 14 for reflecting part of a microwave is provided at a connector of a waveguide 12 to a vacuum vessel 15, and means for rotating a sample 17 to be etched is provided. The microwave incident into the vessel 15 is reduced by the plate 14 to limit a discharge region 16. When the region 16 is reduced, the uniformity therein is improved as compared with the case that the region 16 is large. When the region 16 is narrowed, an area to be treated is reduced, but the entire sample 17 can be uniformly treated by rotating the sample 17 to be etched. Thus, the uniform etching can be performed without control by a magnetic field.
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