发明名称 |
Transparent electroconductive material and process for preparation thereof |
摘要 |
Described is a transparent electroconductive material composed of a transparent synthetic resin substrate and a transparent electroconductive film formed on the resin substrate. At least a surface portion of the resin substrate on which the electroconductive film is formed satisfies a requirement represented by the formula: F x Hv=0.4 wherein F is the mole number ( mu mole/cm2) of a basic dye that can react with or adhere to the unit area of the surface of the synthetic resin, and Hv is the Vickers hardness as determined according to JIS Z-2244. The absolute value of the photoelasticity constant of the resin substrate below the glass transition temperature thereof is not larger than 15 Brewsters. A preferred transparent electroconductive material is prepared by coating an active energy ray-curing composition satisfying a requirement represented by the above formula on a surface of the transparent synthetic resin substrate having the above-mentioned absolute value of the photoelasticity constant; curing the composition with active energy rays; and forming a transparent electroconductive film on the coating layer by a low-temperature sputtering method at a temperature lower than 100 DEG C.
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申请公布号 |
US4758464(A) |
申请公布日期 |
1988.07.19 |
申请号 |
US19860906444 |
申请日期 |
1986.09.12 |
申请人 |
MITSUBISHI RAYON CO., LTD. |
发明人 |
MASUZAWA, TOKIHIKO;TAKESUE, MASATOSHI;KOBAYASHI, YUKIO;MORI, MITSUO |
分类号 |
C08J7/18;C23C14/02;C23C14/08;G02F1/1333;(IPC1-7):C09K19/00 |
主分类号 |
C08J7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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