| 摘要 |
<p>PURPOSE:To intensify strength to mechanical cleaning, etc., by forming the titled photomask having a transparent glass substrate which is formed with recesses in desired regions of one main plane and metallic light shielding films embedded in all the recesses of the substrate and forming said one main plane to flat structure having no ruggedness. CONSTITUTION:This photomask is constructed by embedding metallic chromium films 5 as the metallic light shielding films into the recesses formed to the desired regions on the main plane of the transparent glass substrate 1 and forming the main plane to the flat surface having no ruggedness. Namely, the metallic chromium film 5 to serve as the light shielding film is formed by a method such as sputtering or vacuum deposition to the same thickness as the depth of the recesses 4 formed on the substrate 1 and the unnecessary film 5 and photoresist film 2 are stripped by immersing the substrate into an org. stripping liquid, by which the photomask is produced. The drop-out of the metallic chromium films is thereby obviated in spite of cleaning by scrubbing with a brush or cleaning by jet scrubbing with high-pressure water flow. The mechanical strength higher than the mechanical strength of the conventional photomask is thus obtd.</p> |
