发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE:To obtain a semiconductor manufacturing apparatus so that the highest temperature is obtained at the machining part of a semiconductor element, by changing the winding density of the coil wire of a heater so that a necessary temperature profile is obtained. CONSTITUTION:A coil wire 7 is wound so that the highest density is obtained at a point D, which is a machining (wire bonding) part of a semiconductor element 1. Thus a heater 6 is formed. The winding density of the coil wire 7 of the heater 6 is changed so that the density is higher in the machining part (wire bonding point). Thus temperatures (a), (b) and (c) at preheating parts (points A, B and C) slowly increase. A temperature (d) at the machining part (wire bonding part) becomes the highest temperature.
申请公布号 JPS63172434(A) 申请公布日期 1988.07.16
申请号 JP19870003623 申请日期 1987.01.09
申请人 MITSUBISHI ELECTRIC CORP 发明人 ONO YUKIMITSU;NISHIKAWA YOICHI
分类号 H01L21/60 主分类号 H01L21/60
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