| 摘要 |
PURPOSE:To obtain a thermal head not generating uniformity in recorded density due to scattering of the film thickness of a glaze layer, by using light having a component slanted to a substrate as light for exposure of a photoresist, and causing the area of each recording dot to vary according to the thickness of the glaze layer. CONSTITUTION:A photo-mask 6 provided with a predetermined mask pattern for selective exposure of a photoresist 5 is laid on the back side of the photoresist 5. In this condition, light having a component slanted to the substrate 1 is made to be incident on the substrate 1. Because of the uniformity of the film thickness of a glaze layer 2, a gap is generated between the photoresist 5 and the photo-mask 6. For example, when the film thickness of the glaze layer 2 is 50 mum at a thicker part and 45 mum at a thinner part, a gap of 5 mum is generated. Thus, when the width of a pattern in the mask 6 is 100 mum, the photoresist 5 may be exposed to light with a pattern with of 106 gm, and light having an angle of divergence of about 30 deg. with respect to parallel light may be projected. |
